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[11PacRimLPolyJ319] A Comparative Analysis of Selected Aspects of Patent Law in China and the United States

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dc.contributor.author Sorell, Louis S.
dc.date.accessioned 2011-02-14T22:00:52Z
dc.date.available 2011-02-14T22:00:52Z
dc.date.issued 2002-03
dc.identifier.citation 11 Pac. Rim L. & Pol'y J. 319 (2002) en_US
dc.identifier.issn 1066-8632
dc.identifier.uri http://hdl.handle.net/1773.1/756
dc.description.abstract Louis S. Sorell is a Partner, Baker Botts L.L.P. (New York, NY). Abstract: China's recent admission to the World Trade Organization will bring increased attention to China's patent law, especially as foreign companies expand their technology-based presence in China. This Article summarizes the development of patent law in the United States and China, and compares various aspects of Chinese and American patent law. These aspects include the administrative and judicial hierarchy of the American and Chinese patent systems, patentability requirements, infringement and validity issues, the availability of injunctive relief, and the determination of monetary damages. The Article also discusses the compulsory licensing provisions of China's patent law. Similarities and differences of each patent system are also discussed. en_US
dc.language.iso en_US en_US
dc.publisher Seattle: Pacific Rim Law & Policy Journal, University of Washington School of Law en_US
dc.subject Article en_US
dc.title [11PacRimLPolyJ319] A Comparative Analysis of Selected Aspects of Patent Law in China and the United States en_US
dc.type Article en_US
dc.rights.holder Copyright 2002 by Pacific Rim Law & Policy Association en_US


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